Controlled fabrication of Si nanocrystal delta-layers in thin SiO2 layers by plasma immersion ion implantation for nonvolatile memories

Y. Bonafos, P. Spiegel, P. Normand, G. Ben-Assayag, J. Groenen, M. Carrada, P. Dimitrakis, E. Kapetanakis, B.S. Sahu, A. Slaoui, F. Torregrosa, Applied Physics Letters (2013) 103, 253118.