Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: Effect of photoacid generator, sensitizer and quencher

V.-K. M. Kuppuswamy, V. Constantoudis, E. Gogolides, A. V. Pret, R. Gronheid, Journal of Micro/ Nanolithography, MEMS and MOEMS (2013) 12, 023003.