Deposition of undoped and H doped WOx (x≤3) films in a hot-wire atomic layer deposition system without the use of tungsten precursors

I. Kostis, M. Vasilopoulou, G. Papadimitropoulos, N. Stathopoulos, S. Savaidis, D. Davazoglou, Surface and Coatings Technology (2013) 230, 51-58.