MATERIALS FOR NANOLITHOGRAPHY AND ORGANIC ELECTRONICS – Publications-Patents

Patents

Molecular resists based on functionalized polycarbocycles, Argitis P. et al (2012) US8247158.

Memory devices using proton-conducting polymeric materials [Protonenleitende polymermatarialien veswendende speicheranordnungen], Normand P. et al (2011)  EP2277202.

Photoresists processable under biocompatible conditions for multi-biomolecule patterning, Argitis P. et al (2009) US7608389.

Memory devices using proton-conducting polymeric materials [DISPOSITIFS DE MÉMOIRE UTILISANT DES MATÉRIAUX POLYMÈRES CONDUCTEURS DE PROTONS], Normand P. et al (2009) WO2009127884.

Tuning the emission color of single layer, patterned full color organic emitting diodes, Argitis P. et al (2009) US20090224274.

Tuning the emission color of single layer, patterned full color organic emitting diodes [ABSTIMMEN DER EMISSIONSFARBE VON EINSCHICHTIGEN STRUKTURIERTEN ORGANISCHEN VOLLFARBEN-LEUCHTDIODEN], Argitis P. et al (2009) EP2044635.

MOLECULAR RESISTS BASED ON FUNCTIONALIZED POLYCARBOCYCLES | [MOLEKULARER RESIST AUF DER BASIS FUNKTIONALISIERTER POLYCARBOCYCLEN], Argitis P. et al, (2008) EP1941324.

Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties, Gogolides E. et al (2008) US7326510.

TUNING THE EMISSION COLOR OF SINGLE LAYER, PATTERNED FULL COLOR ORGANIC LIGHT EMITTING DIODES | [RÉGLAGE DE LA COULEUR D’ÉMISSION D’UNE COUCHE UNIQUE, DIODES ÉLECTROLUMINESCENTES ORGANIQUES STRUCTURÉES EN COULEURS], Argitis P. et al (2007) WO2007148140.

MOLECULAR RESISTS BASED ON FUNCTIONALIZED POLYCARBOCYCLES | [PHOTORESINE MOLECULAIRE A BASE DE POLYCARBOCYCLES FONCTIONNALISES] Argitis P. et al (2007) WO2007031803.

Lithographic materials based on polymers containing polyhedral oligomeric silsesquioxanes, Gogolides et al (2006) US20060166128.

LITHOGRAPHIC MATERIALS BASED ON POLYMERS CONTAINING POLYHEDRAL OLIGOMERIC SILSESQUIOXANES | [LITHOGRAPHISCHE MATERIALIEN, DIE POLYEDRISCHE OLIGOMERE SILSESQUIOXANE ENTHALTENDE POLYMERE ENTHALTEN], Gogolides E. et al (2005) EP1552346.

Photoresists processable under biocompatible conditions for multi-biomolecule patterning, Argitis P. et al (2005) US20050037276.

Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties, Gogolides E. et al (2005) US20050026068.

POLYCARBOCYCLIC DERIVATIVES FOR MODIFICATION OF RESIST, OPTICAL AND ETCH RESISTANCE PROPERTIES | [POLYCYCLISCHE DERIVATE ZUR VERÄNDERUNG DER OPTISCHEN EIGENSCHAFTEN UND ÄTZBESTÄNDIGKEITSEIGNENSCHAFTEN], Gogolides E. et al (2004) EP1444550.

PHOTORESISTS PROCESSABLE UNDER BIOCOMPATIBLE CONDITIONS FOR MULTI-BIOMOLECULE PATTERNING | [UNTER BIOKOMPATIBLEN BEDINGUNGEN VERARBEITBARE FOTORESISTS ZUR ERZEUGUNG VON BIOMOLKÜL-MUSTERN], Argitis P. (2004) EP1395878.

LITHOGRAPHIC MATERIALS BASED ON POLYMERS CONTAINING POLYHEDRAL OLIGOMERIC SILSESQUIOXANES | [MATERIAUX LITHOGRAPHIQUES A BASE DE POLYMERES CONTENANT DES SILSESQUIOXANES OLIGOMERES POLYEDRIQUES], Gogolides E et al (2003) WO03102695.

POLYCARBOCYCLIC DERIVATIVES FOR MODIFICATION OF RESIST, OPTICAL AND ETCH RESISTANCE PROPERTIES | [DERIVES POLYCARBOCYCLIQUES DESTINES A MODIFIER DES PROPRIETES DE RESERVE, OPTIQUES ET DE RESISTANCE A LA GRAVURE], Gogolides E. et al (2003) WO03038523.

PHOTORESISTS PROCESSABLE UNDER BIOCOMPATIBLE CONDITIONS FOR MULTI-BIOMOLECULE PATTERNING | [PHOTORESISTS POUVANT ETRE TRAITES DANS DES CONDITIONS BIOCOMPATIBLES POUR LA CONFIGURATION MULTIBIOMOLECULAIRE], Argitis P. (2002) WO02097533.

Silylation of epoxy-containing photoresist films, Gogolides E. et al (2001) US6296989.