Administrative Staff

Kalpouzou Maria

External Collaborators

Chronis Nikos


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ΟΒΙ ΔΙΠΛΩΜΑ 20140100142ΟΒΙ ΔΙΠΛΩΜΑ 20140100319

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Project Webpages

LOGO Lovefood2market






Science for Piece project no 984555: Atmospheric Plasma Jet for Neutralization of CBW

Spin-off companies from our team




demokritos-“LOVEFOOD” FP7-Project, in which NCSR “Demokritos” is a partner, was included in EU’s Edition “Achievements of FP7: Examples that Make us Proud”

-The plasma Nanotechnology – Lab on Chip group of INN is a partner of the H2020-ICT KET Innovation Action entitled LoveFood2Market. The project is a continuation of project (LOVE-FOOD 2012-2016) towards TRL 6, and it targets the development and commercialization of a new diagnostic system for pathogen detection in food samples. Drs Evangelos Gogolides, Angeliki Tserepi, Vasilios Constantoudis and Stavros Chatzandroulis from INN and Drs Dimitrios Mastellos, Sotirios Kakabakos and Panagiota Petrou from INRASTES participate in the project, which is coordinated by Dr. Electra Gizeli from the University of Crete-FORTH. 3 Companies (from Germany, France, Greece), and 2 more academic / research partners (from France and Czech republic) participate in the project.

-Our research team received the 2nd Prize of the Hellenic Innovation and Applied Research Contenst organized by Eurobank and the Hellenic Industry Association 2013. For more details please click here.

-Researchers from our team participating in the Nanometrisis spin-off company were selected among the top 30 finalists in the Hello Tomorrow innovation contest. The final selection will take place in Paris on June 25th-27th 2015,


Watch the video describing our technology:


(video in English)


(video in Greek)


  • For nanostructure metrology visit the web site of Nanometrisis spin-off company
  • For Micro and nano topography evolution see
  • For plasma gas phase chemistry see

Classes, tutorials and other educational material

  • “Microelectronics and Microsystems fabrication processes”, (E. Gogolides, D. Davazoglou, A. Nassiopoulou), Postgraduate Programs on Microsystems and Nanodevices of the National Technical University of Athens and Micro and Nano Electronics of the National and Kapodistrian University of Athens

We acknowledge KLA-Tencor ( for providing 42 licenses of PROLITH Software for use by the graduate students of the classes “Micoelectronics and Microsystems Fabrication Processes” (Instructors D. Davazoglou, E. Gogolides, A. Nassiopoulou) by the two Masters Programs of Microelectronics and Microsystems (NKUA, NTUA coordinated respectively)

  • “Fabrication and Characterization of nanostructures using plasma etching and bottom up techniques”, (E. Gogolides, C. Charitidis), Postgraduate Programs on Microsystems and Nanodevices of the National Technical University of Athens
  • “Plasma Processing for Micro and Nano Fabrication”, (E. Gogolides, G. Kokkoris, V. Constantoudis, A. Tserepi), Postgraduate Program on Microelectronics of the National and Kapodistrian University of Athens
  • “Microfluidic systems”, (D. Mathioulakis, I. Anagnostopoulos, A. Tserepi, G. Kokkoris), Postgraduate Program on Microsystems and Nanodevices of the National Technical University of Athens
  • “Simulation of Micro and Nano-Patterning”, (E. Gogolides, G. Kokkoris, V. Constantoudis, A. Tserepi), Postgraduate Program on Mathematical Modelling in Modern Technologies and Financial Engineering of the National Technical University of Athens
  • “Process and device simulation” (G. Kokkoris), Postgraduate Program on Microelectronics of the National and Kapodistrian University of Athens


We offer services as a part time to our research activities for small volume:

  • Plasma etching of Silicon or polymers, and plasma surface modification
  • Contact angle measurements
  • Spectroscopic Ellispometry for film thickness measurement
  • Reflectance transmittance measurement

For higher volume services please contact our spin-off companies

Welcome to our group Plasma Enabled Nanofabrication and Applications, Computational Nanometrology, and Process Simulation

Our group works on plasma technology for nanostructure fabrication and applications, computational nanometrology for the characterization of the fabricated nanostructures and, plasma process simulation for understanding and predicting plasma process effects.

  1. An introduction to plasma nanotechnology

        Plasma is considered as the fourth state of matter and consists of a partially ionized gas containing neutral radicals, positive and often negative ions, and electrons. The plasma is quasi neutral. Typically, plasmas used for materials processing and nanotechnology are of relatively low electron density (i.e. number of electrons is less than one millionth of the gas molecules), and are “cold”, meaning that the gas is at a relatively low temperature of 300-500 K, electrons are “hot” with temperature larger than 11600 K (1eV). These hot electrons are responsible for gas ionization, dissociation to useful radicals, and photon emission. Plasma excited in a quartz cylinder is shown in Fig. 1.1.

        Plasmas in vacuum have been extensively used for nanoelectronics fabrication for film deposition, film etching, patterned film etching for nanostructure fabrication, ion implantation and various other processes. The 80s, and 90s are the times when a first revolution in plasma technology has taken place due to the amazing speed of the micro and nanoelectronics industry. Today, we are at the age of “nanoplasma” being able to etch down nanoscale features through nanoscale lithographically defined patterns. Fig. 1.2 shows silicon nanopillars created by plasma etching after electron beam lithography.

        Plasmas are also ideal for engineering the surface of materials, especially temperature sensitive ones, and changing the surface properties creating smart multifunctional material surfaces. Fig. 1.3 shows superhydrophobic and superoleophobic surfaces repelling water and oils, fabricated by plasma processing.

        Plasmas are also ideal for maskless nanostructure fabrication on metals, as well as nanomaterial fabrication. During the past decade plasma nanoscience and plasma nanotechnology has emerged as a second revolution in plasma technology (see special issue: Perspectives in Plasma Nanoscience edited by K. Ostrikov et al ).

In the last few years we are witnessing the third revolution in plasma technology, by moving away from vacuum processing to atmospheric pressure plasma processing of materials for medicine, agriculture, safety, and of course surface engineering of large surfaces. We have invented both wafer scale atmospheric pressure Dielectric Barrier Discharge apparatus (Fig. 1.4), and smaller ones tailored to the size of a particular microfluidic device as shown in (Fig. 1.5). See also relevant publications from our group in nanopattern formation with atmospheric plasma (open access), a review of wetting control via atmospheric plasmas and a microfluidic device for bone marrow-on-a-chip (open access)

  1. Our group and our activities

Our project comprises activities (see Fig. 2.1) related to our core technology namely Plasma Technology, coupled with activities in metrology of the micro and nanostructures produced by plasma processes, as well as by design and simulation of processes. These activities illustrated below enable a significant number of applications on surface engineering, wetting control, “smart surfaces”, “smart devices and microfluidics”, food preservation and sterilization, and many more. Our project objectives can therefore be summarized as follows:

  • Advance plasma nanotechnology and nanofabrication
  • Develop computational nanometrology for nanostructure characterization.
  • Understand and design improved processes using modeling and simulation.
  • Exploit our plasma technology toolbox for enabling a variety of applications. Applications target: (1) Surface Engineering (“smart surfaces” section, (2) Plasma applications in food, agriculture, safety, etc. (3) Various other applications such as “smart” microfluidics”, nanoelectronic devices are undertaken in collaboration with other projects.
  • Transfer our technology to spin-out companies or industry and created added value to the society from our research efforts. We are proud of two spin-out companies exploiting our results in Life Sciences and Diagnostics by Nanoplasmas p.c., and in nanometrology Nanometrisis p.c. Nanoplasmas received equity funding from unifund to develop a chip for untrafast detection of Legionella bacterium in water. Nanometrisis has received the 2019 Athens Commerce and Industry Association start up award for its promising nanometrology software:. In addition, team members have won one of the prizes of the GreenTech awards organized by NTUA, with their idea of plasma processing named Aurora.

For all these objectives, we work in coordination with the clean room facility, often transferring samples to and from it, and in collaboration with the Lab on a Chip projects, as well as several other projects within INN, institutes in NCSRD and partners in Greece and abroad.

Our team’s photos are seen in Figs. 2.2-2.4 in recent gatherings in the pro-COVID-19 times. This particular picture 2.2 is for the annual Saint Basil cake for 2019 and the group annual review. Fig. 2.3 is in from of our building in the beautiful forest of NCSR Demokritos in November 2019. Fig. 2.4 is from the evening excursion to Lindos, Rhodes island, after the MNE 2019 (Micro and Nano Engineering 2019) international conference organized by our group (3 researchers involved in the organizing committee) in Rhodes, Greece, September 2019

  • Fig. 2.1 Activities of the group

  • Fig. 2.2 A pre-COVID-19 photograph of our group

  • Fig 2.3 NCSR Demokritos in November 2019

  • Fig 2.4 Excursion to Lindos, Rhodes island, after the MNE 2019 international conference

  1. An evolution of the group activities through the years

We have been following and pioneering as a group the evolution of plasma technology and processing. Starting from plasma etching of polymers and Silicon, plasma etching simulation (see Fig. 3.1), nanometrological analysis of line edge roughness patterns after lithography and plasma etching (see Fig. 3.2) we have moved to nanoscale silicon etching for ultra-high aspect ratio silicon nanopillars (see Fig. 1.2). Then we pioneered a revolutionary plasma technology, which we term plasma micro-nanotexturing for polymeric surfaces (see Fig. 3.3), and have created multifunctional polymers with superhydrophobicity, superhydrophilicity, superamphiphobicity, optical property control, biomolecule adhesion control, cell growth control, and antibacterial properties. In addition, we applied such modifications in microfluidics creating “smart” functional microfluidics. Our efforts are reviewed in a recent publication (see Fig. 3.4). Recently, we showcased atmospheric Dielectric Barrier Discharges for etching and wetting modification of polymers, fabricating superhydrophobic paper see Fig. 3.5), and demonstrating etching and nanofabrication for the first time using atmospheric pressure plasma (see Fig. 3.6). Our work in vacuum and atmospheric pressure plasmas is expanding rapidly in new field, such as food preservation, and new “smart” functionalities, such as antifogging surfaces (see Fig. 3.7).