PLASMA ENABLED NANOFABRICATION AND APPLICATIONS – Publications-Patents

  1. Method for the fabrication of high surface area ratio and high aspect ratio surfaces on substrates
    Greek patent application 20050100473 – 16/09/2005, Patent grant No. 1006890
    European patent application 06710193.1 – 08/03/2006, Patent grant No. EP1937757
  2. Method for making a microarray
    Greek patent application 20070100394 – 20/06/2007, Patent grant No. 1006042
    European patent application 08762641.2 – 20/06/2008, Patent grant No. EP2173474
  3. Method for the fabrication of periodic structures on polymers using plasma processes
    Greek patent application 20080100404 – 13/06/2008, Patent grant No. 1006618
    European patent application 09762028.0 – 15/06/2009, Patent grant No. EP2300214
    US patent application 12/997,701 – 15/06/2009, Patent grant No. US 8951428
  4. Gaseous Plasma nanotextured substrates for selective enrichment of cancer cells
    Greek patent application 20140100142 – 12/03/2014, Patent grant No. 1009056
    European patent application 15386007.7 – 12/03/2015, Patent grant No. EP2918675
  5. Method to fabricate chemically-stable plasma-etched substrates for direct covalent biomolecule immobilization
    Greek patent application 20140100319 – 03/06/2014, Patent grant No. 1009057
    European patent application 15386014.3 – 29/05/2015, Patent grant No. EP3284581
  6. Large Area, Uniform, Atmospheric Pressure Plasma Processing Device
    Greek patent application 20150100397 – 09/09/2015, Patent grant No. 1009432
    European patent application 16386016.6 – 08/09/2016
  7. Variable Faraday shield for a substrate holder, a clamping ring, or an electrode, or their combination in a plasma reactor
    Greek patent application 20160100220 – 27/04/2016, Patent grant No. 1009426
    European patent application 17386017.2 – 26/04/2017

Joined patents of our Project with Project MATERIALS FOR NANOLITHOGRAPHY AND ORGANIC ELECTRONICS

  1. Microlithographic materials and processes based on poly (hydroxyalkyl acrylates)
    Greek patent application 19990100172 – 26/05/1999, Patent grant No. 1003420
  2. Silylation of epoxy-containing photoresist films
    US patent application 09/152,046 – 11/09/1998, Patent grant No. US 6296989
  3. Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties
    Greek patent application 20010100506 – 01/11/2001, Patent grant No. 1004163
    European patent application 02790329.3 – 31/10/2002, Patent grant No. EP1444550
    US patent application 10/494,547 – 31/10/2002, Patent grant No. US 7326510
  4. Lithographic materials based on polymers containing polyhedral oligomeric silsesquioxanes
    Greek patent application 20020100253 – 30/05/2002, Patent grant No. 1004403
    European patent application 03725462.0 – 30/05/2003, Patent grant No. EP1552346
  5. Molecular resists based on functionalized polycarbocycles
    Greek patent application 20050100472 – 16/09/2005, Patent grant No. 1005438
    European patent application 06779677.1 – 18/09/2006, Patent grant No. EP1941324
    US patent application 12/066,995 – 18/09/2006, Patent grant No. US 8247158