THIN FILMS BY CHEMICAL VAPOR AND ATOMIC LAYER DEPOSITION – About the group

The objectives of this group include research and development in the following:

  • Process and material development
  • Characterization of CVD-ALD films
  • Applications of CVD-ALD films in:

1. Copper metallization of single- and multi- crystalline Si Solar Cells 2. Contact formation to organic Solar Cells 3. Gas Sensors based on various metal-oxide films (WO3, MoO3, VOx, TaOx, etc) 4. Large area electronics on metal-halide and -oxide semiconductors (MoS2, MoO3, Cu2S, Cu2O) The group offers CVD-ALD services:

  • Bubblers for liquid precursors
  • Custom made CVD-ALD chambers

The group also offers field test for solar PV panels