Research Interests :

Email :

Technical Scientific Personnel
+30 210 650 3267 / 3121
Professional Experience

08/2012 - 08/2015 – NCSR DEMOKRITOS
Design and development of microcontrollers, down-scaling, system control design, of plasma source; electrical probe plasma characterization for NATO Science for Peace & Security research Program titled “Atmospheric pressure plasma jet for neutralization of CBW (chemical biological weapons)”

10/2012 – 08/2015 – NCSR DEMOKRITOS
Electrical / Electronic Engineering services for technical support at ICP plasma system and other relevant equipment for Nano structuring. Process design and optimization of existing processes for Silicon and polymeric etching. Activation and modification of surfaces.
Design and construction of new shielded RF ICP source. Design and construction of wide area atmospheric RF plasma source for material treatments. Construction and design of all electronic controllers for the research program Excellence titled “Plasma Nanofactory”.

02/2009-09/2012 – NCSR DEMOKRITOS
Electronic Engineering services for technical support for ICP Alcatel reactor plasma system and other relevant equipment for Nano structuring. Process design and optimization of existing processes for Silicon and polymeric etching. Activation and modification of surfaces for the research program SPAM - Surface Physics for advanced Manufacturing.

10/2008-02/2009 – UNIVERSITY OF ARHENS
Logic Design as a lab Assistant, Department of Informatics, University of Athens (UOA).

Programming and maintenance of robotic machines (Pick & Place) at SMD section of Micrelec Electronics S.A.

Internships in Micrelec Electronics SA


M.Sc. in Microelectronics: direction manufacturing technology.

"Nanopillars and vertical silicon nanowires fabrication using silicon plasma etching processes in room temperature. "
This work demonstrates the fabrication of high aspect ratio silicon nanopillars, perpendicular to the substrate nanowires using room temperature plasma etching. Two fluorocarbon, fluorine, oxygen plasma etching processes are being presented: A) A mixed process and B) a pulsed gas flow process for nanoscale plasma etching (NPGF). Nanopillars, Nanowires with 74:1 aspect ratio, and etch rate 1.8 μm/min were fabricated using ΝPGF process. With the mixed gas process we fabricated nanopillars with an aspect ratio 4:1 and etch rate 250 nm/min.

Graduated from the Department of Electronics of Piraeus University of Applied Sciences. (Electronic Engineer)

"CLASSIFICATION, MEASUREMENT OF SURFACE COLOR”. Recognition of colors using RGB sensors, atmel microcontroller and AVR GCC programming language.


Certified LON Engineer by Schneider Electric, in Smartstructure Solution (BMS)

10/2013 – 12/2013
Seminar ΙΝΕΜΗ «Explore Alternative Markets, Negotiations»

Seminar KNX Partner, Design and programming of bus devises, for smart homes and buildings with KNX communication protocol.

Foreign Languages

ENGLISH: F.C.E. (Cambridge)

Special Skills

• Use, operation, repair of ICP plasma reactor with vacuum systems, RF generators, PLC automation knowledge, RF component characterization. Design of passive and active circuits compliant with the ICP reactor for upgrade or replacement parts.
• Use and operation of measurement equipment like Multimeter, Oscilloscope, power meter e.t.c.
• Use and operation of spectroscopic ellipsometry (JA WOOLAM CO., INC / FLS300), atomic scanning microscope (Veeco).
• Knowledge and use of PC, environment in Windows and LINUX, MS Office.
• Programming Languages
Pascal, ANSI C, Embedded C, AVR GCC, MATLAB, VHDL, AVR ASSEMBLY, Z-80 ASSEMBLY, .NET Visual Basic, Java.
• Software analysis and design automation.
Comsol, Protel, DXP, OrCAD, microwind, CAMTASTIC, Autocad, ETS3, ETS4

Papers, Associate in papers, conferences.

• Ultrahigh aspect ratio Si nanowires fabricated with plasma etching: plasma processing, mechanical stability analysis against adhesion and capillary forces and oleophobicity, A Zeniou, K Ellinas, A Olziersky and E Gogolides, Nanotechnology 25 (2014) 035302 (11pp)
• Controllable fabrication of bioinspired three-dimensional ZnO/Si nanoarchitectures, E. Makarona, M.C. Skoulikidou, Th. Kyrasta, A Smyrnakis, A Zeniou, E. Gogolides, C. Tsamis, 2015, Materials Letters , Volume 142, Pages 211–216
• High-aspect-ratio Si nanowire fabrication using Colloidal Self-assembly and fluorine-based plasma etching (poster) Zeniou, A. Smyrnakis, E. Gogolides, Plasma Etch and Strip in Microelectronics (PESM) Μarch 15-16, 2012, Grenoble, France
• "High aspect ratio, plasma etched silicon nanowires for photovoltaic application: Fabrication and characterization (Invited talk)"Smyrnakis, A. Zeniou, E. Almpanis, N. Papanikolaou, P. Dimitrakis, E. Gogolides
XI International Conference on Nanostructured Materials (NANO 2012) August 26-31, 2012, Rodes, Greece
• High aspect ratio, plasma etched silicon nanowires: Fabrication and optical property characterization (oral)
Smyrnakis, A. Zeniou, E. Almpanis, N. Papanikolaou, E. Gogolides 38th International Micro & Nano Engineering Conference (MNE), September 16-20, 2012, Toulouse, France
• Temperature effects on plasma induced nanotexturing of polymeric films, evaluated by in-situ spectroscopic ellipsometry (poster), G. Aksenov, A. Zeniou, E. Gogolides 4th International Workshop on Plasma Etch and Strip in Microelectronics (PESM 2011), 5-6 May 2011, Mechelen, Belgium.
• Plasma Directed Assembly and Organization: Effect of Plasma Processing Conditions on Order and Nanodot Dimensions (poster) D. Kontziampasis, G. Kokkoris, V. Constantoudis, A. Smyrnakis, A. Zeniou, E. Gogolides
The 54th International Conference on Electron, Ion and Photon Beam technology and Nanofabrication (EIPBN), Anchorage, Alaska, June 1-4,2010
• “Mesh-assisted” colloidal lithography and plasma etching: A route to large-area, uniform, ordered nano-pillar production on versatile substrates (poster), K. Ellinas, A. Malainou, A. Zeniou, A. Tserepi, E. Gogolides, 36th International Conference on Micro & Nano Engineering, GENOA (Italy), 19-22 September 2010