Nika, A., Oikonomou, P., Manouras, T., Argitis, P., Vamvakaki, M., Sanopoulou, M., Raptis, I. and Chatzichristidi, M., Reversible chemocapacitor system based on PDMAEMA polymers for fast sensing of VOCs mixtures Microelectronic Engineering, Volume 227, Article Number: 111304, 2020 [doi]

Raptis, Ioannis and Glezos, Nikos, Electron Beam Lithography Simulation for Subquartermicron and High Density Patterns Simulation of Semiconductor Processes and Devices 2001: SISPAD 01, Springer Science & Business Media, Pages: 404, 2012 [doi]

Argitis, P., Niakoula, D., Douvas, A.M., Gogolides, E., Raptis, I., Vidali, V.P. and Couladouros, E.A., Materials for lithography in the nanoscale International Journal of Nanotechnology, Volume 6, Pages: 71-87, 2009 [doi]

Chatzichristidi, M., Petrou, P.S., Douvas, A.M., Diakoumakos, C.D., Raptis, I., Misiakos, K., Kakabakos, S.S. and Argitis, P., Photolithographic process based on high contrast acrylate photoresist for multi-protein patterning Volume 950, Pages: 205-210, 2006 [doi]

Vasilopoulou, M., Raptis, I., Argitis, P., Aspiotis, I. and Davazoglou, D., Polymeric electrolytes for WO3-based all solid-state electrochromic displays Microelectronic Engineering, Volume 83, Pages: 1414-1417, 2006 [doi]

Niakoula, D., Raptis, I., Goustouridis, D. and Argitis, P., Glass transition temperature monitoring in bilayer and patterned photoresist films Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Volume 43, Pages: 5247-5248, 2004 [doi]

Niakoula, D., Raptis, I., Bellas, V. and Argitis, P., Glass transition temperature studies in thin photoresist films with an interferometric method Volume 5039 I, Pages: 357-365, 2003 [doi]

Diakoumakos, C.D., Douvas, A., Raptis, I., Kakabakos, S., Dimotikalli, D., Terzoudi, G. and Argitis, P., Dilute aqueous base developable resists for environmentally friendly and biocompatible processes Microelectronic Engineering, Volume 61-62, Pages: 819-827, 2002 [doi]

Chatzichristidi, M., Raptis, I., Diakoumakos, C.D., Glezos, N., Argitis, P. and Sanopoulou, M., Strippable aqueous base developable negative photoresist for high aspect ratio micromachining Microelectronic Engineering, Volume 61-62, Pages: 729-735, 2002 [doi]

Raptis, I., Chatzichristidi, M., Diakoumakos, C.D., Douvas, A., Niakoula, D. and Argitis, P., Application of a novel aqueous base developable resist in micromachining Journal of Photopolymer Science and Technology, Volume 14, Pages: 445-448, 2001 [doi]

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Disclaimer: Publications of INN count all publications involving members of its constituent groups, including those authored when members were working in other Institutions (i.e. without INN affiliation). We apologize for this inconvenience due to method used to find group publications, and declare that the Institute has no claims over publications involving non-INN affiliations.

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