Smyrnakis, Athanasios, Ioannou, Dimosthenis, Ellinas, Kosmas, Tserepi, Angeliki and Gogolides, Evangelos, Real-Time Monitoring and Quantification of Underwater Superhydrophobicity Advanced Materials Interfaces, Volume 9, Pages: 2101393, 2022 [doi]

Zeniou, A., Smyrnakis, A., Constantoudis, V., Awsiuk, K. and Gogolides, E., One-step control of hierarchy and functionality of polymeric surfaces in a new plasma nanotechnology reactor Nanotechnology, Volume 32, Article Number: 235305, 2021 [doi]

Smyrnakis, A., Ioannou, D., Ellinas, K., Tserepi, A. and Gogolides, E., Real-Time Monitoring and Quantification of Underwater Superhydrophobicity Advanced Materials Interfaces, 2021 [doi]

Smyrnakis, A., Zeniou, A., Awsiuk, K., Constantoudis, V. and Gogolides, E., A non-lithographic plasma nanoassembly technology for polymeric nanodot and silicon nanopillar fabrication Frontiers of Chemical Science and Engineering, Volume 13, Pages: 475-484, 2019 [doi]

Dimitrakellis, P., Patsidis, A.C., Smyrnakis, A., Psarras, G.C. and Gogolides, E., Atmospheric Plasma Nanotexturing of Organic-Inorganic Nanocomposite Coatings for Multifunctional Surface Fabrication ACS Applied Nano Materials, Volume 2, Pages: 2969-2978, 2019 [doi]

Dimitrakellis, P., Smyrnakis, A., Constantoudis, V., Tsoutsou, D., Dimoulas, A. and Gogolides, E., Atmospheric pressure plasma directed assembly during photoresist removal: A new route to micro and nano pattern formation Micro and Nano Engineering, Volume 3, Pages: 15-21, 2019 [doi]

Smyrnakis, A., Dimitrakis, P. and Gogolides, E., Plasma-etched, silicon nanowire, radial junction photovoltaic device Journal of Physics D: Applied Physics, Volume 51, Article Number: 455101, 2018 [doi]

Smyrnakis, A., Dimitrakis, P., Normand, P. and Gogolides, E., Fabrication of axial p-n junction silicon nanopillar devices and application in photovoltaics Microelectronic Engineering, Volume 174, Pages: 74-79, 2017 [doi]

Smyrnakis, A., Almpanis, E., Constantoudis, V., Papanikolaou, N. and Gogolides, E., Optical properties of high aspect ratio plasma etched silicon nanowires: Fabrication-induced variability dramatically reduces reflectance Nanotechnology, Volume 26, Article Number: 085301, 2015 [doi]

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Disclaimer: Publications of INN count all publications involving members of its constituent groups, including those authored when members were working in other Institutions (i.e. without INN affiliation). We apologize for this inconvenience due to method used to find group publications, and declare that the Institute has no claims over publications involving non-INN affiliations.

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