Ge interface engineering using ultra-thin La2O3 and Y2O3 films: A study into the effect of deposition temperature

Z. Mitrovic, M. Althobaiti, A. D. Weerakkody, V. R. Dhanak, W. M. Linhart, T. D. Veal, N. Sedghi, S. Hall, P. R. Chalker, D. Tsoutsou and A. Dimoulas J. Appl. Phys. (2014) 115, 114102.