Thermal and UV light assisted micro/nano patterning on rigid or flexible substrates. The CNI tools is a desktop lithography tool which give the opportunity to replicate a 4-inch master stamp with sub 20nm resolution. 

NIL lithography is used in a wide field of application such as: optics, (nano) photonics, Nano electronics, biomimetics, biotechnology, photovoltaics, NEMS/MEMS, etc.

• Technical Specifications

• Thermal and UV Light assisted modes
• Substrate size: up to 4 inch
• Substrate thickness: up to 10mm
• Max Temperature: 220 ^oC
• Max Pressure: 11 bars
• UV Light wavelength: 365 nm