CVD/Chemical Vapor Deposition

Tool
ANNEALSYS CVD reactor

Applications
CVD growth

Technical Specifications
ANNEALSYS CVD reactor for graphene growth:

-fully automated

-4-inch cold wall

-equipped with graphite susceptor

-growth up to 1200°C-pressure range 2·10-2Torr up to atmospheric

Other Capabilities: Rapid thermal processing with a rump up rate of 200°C/s and a fast-cooling rate.