Development of polycrystalline silicon thin film transistor technology with advanced annealing and device characterization techniques

ACRONYM:

PENED 2005-2009

LEADER:

Dimitrios N. Kouvatsos

START DATE:

15/12/2005

LATE DATE:

15/12/2008

FUNDING SOURCE:

90% EU, 10% Sharp Labs of America (173.000 €)

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