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RESEARCH INTERESTS

Plasma Nanoscience, Etching & Nanofabrication, Advanced material characterization, Mass Spectroscopy, Proteomics

ABOUT/BIOGRAPHY

Dr A. Smyrnakis has a Diploma in Applied Physics and a M.Sc. in Microsystems and Nanodevices from National Technical University of Athens (NTUA). He holds a Ph.D. from the School of Chemical Engineering (NTUA) that held in collaboration with the Plasma Nanofabrication Laboratory of the Institute of Nanoscience and Nanotechnology, NCSR Demokritos. His Ph.D. thesis was about plasma self-assembly and fabrication of plasma-etched silicon nanowires for energy application. He is currently working as postdoctoral researcher in collaboration with Fasmatech SA under the Industrial Research Fellowship Program at NCSR Demokritos. His research interests focus on plasma physics & nanoscience, process development for plasma etching and nanostructuring of materials, plasma diagnostics, advanced materials characterization, mass spectroscopy and ion optics for several applications including energy, life sciences and proteomics.

WEBSITES

https://orcid.org/0000-0003-1677-4214

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PUBLICATIONS

Smyrnakis, A., Ioannou, D., Ellinas, K., Tserepi, A. and Gogolides, E., Real-Time Monitoring and Quantification of Underwater Superhydrophobicity Advanced Materials Interfaces, 2021 [doi]

Zeniou, A., Smyrnakis, A., Constantoudis, V., Awsiuk, K. and Gogolides, E., One-step control of hierarchy and functionality of polymeric surfaces in a new plasma nanotechnology reactor Nanotechnology, Volume 32, Article Number: 235305, 2021 [doi]

Dimitrakellis, P., Smyrnakis, A., Constantoudis, V., Tsoutsou, D., Dimoulas, A. and Gogolides, E., Erratum to “Atmospheric pressure plasma directed assembly during photoresist removal: A new route to micro and nano pattern formation” (Micro and Nano Engineering (2019) 3 (15–21), (S2590007219300140), (10.1016/j.mne.2019.03.001)) Micro and Nano Engineering, Volume 3, Pages: 94, 2019 [doi]

Dimitrakellis, P., Smyrnakis, A., Constantoudis, V., Tsoutsou, D., Dimoulas, A. and Gogolides, E., Atmospheric pressure plasma directed assembly during photoresist removal: A new route to micro and nano pattern formation Micro and Nano Engineering, Volume 3, Pages: 15-21, 2019 [doi]

Smyrnakis, A., Zeniou, A., Awsiuk, K., Constantoudis, V. and Gogolides, E., A non-lithographic plasma nanoassembly technology for polymeric nanodot and silicon nanopillar fabrication Frontiers of Chemical Science and Engineering, Volume 13, Pages: 475-484, 2019 [doi]

Dimitrakellis, P., Patsidis, A.C., Smyrnakis, A., Psarras, G.C. and Gogolides, E., Atmospheric Plasma Nanotexturing of Organic-Inorganic Nanocomposite Coatings for Multifunctional Surface Fabrication ACS Applied Nano Materials, Volume 2, Pages: 2969-2978, 2019 [doi]

Smyrnakis, A., Dimitrakis, P. and Gogolides, E., Plasma-etched, silicon nanowire, radial junction photovoltaic device Journal of Physics D: Applied Physics, Volume 51, Article Number: 455101, 2018 [doi]

Smyrnakis, A., Dimitrakis, P., Normand, P. and Gogolides, E., Fabrication of axial p-n junction silicon nanopillar devices and application in photovoltaics Microelectronic Engineering, Volume 174, Pages: 74-79, 2017 [doi]

Makarona, E., Skoulikidou, M.C., Kyrasta, Th., Smyrnakis, A., Zeniou, A., Gogolides, E. and Tsamis, C., Controllable fabrication of bioinspired three-dimensional ZnO/Si nanoarchitectures Materials Letters, Volume 142, Pages: 211-216, 2015 [doi]

Smyrnakis, A., Almpanis, E., Constantoudis, V., Papanikolaou, N. and Gogolides, E., Optical properties of high aspect ratio plasma etched silicon nanowires: Fabrication-induced variability dramatically reduces reflectance Nanotechnology, Volume 26, Article Number: 085301, 2015 [doi]

Kontziampasis, D., Boulousis, G., Smyrnakis, A., Ellinas, K., Tserepi, A. and Gogolides, E., Biomimetic, antireflective, superhydrophobic and oleophobic PMMA and PMMA-coated glass surfaces fabricated by plasma processing Microelectronic Engineering, Volume 121, Pages: 33-38, 2014 [doi]

Ellinas, K., Smyrnakis, A., Malainou, A., Tserepi, A. and Gogolides, E., "Mesh-assisted" colloidal lithography and plasma etching: A route to large-area, uniform, ordered nano-pillar and nanopost fabrication on versatile substrates Microelectronic Engineering, Volume 88, Pages: 2547-2551, 2011 [doi]

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