Mathematical and Computational Nanometrology, Surface modeling and characterization


George Papavieros is currently a Physics PhD student on computational nanometrology in the Aristotle University of Thessaloniki and The National Center for Scientific Research "Demokritos" (NCSR). He holds a MS in Applied physics and a Bachelor in Physics with research experience in optical networks, microelectronics, MEMS, material science and device simulation. The PhD project is funded by the Stavros Niarchos foundation program for industrial doctorate degrees, in collaboration with NCSR and Nanometrisis a spin-out company of NCSR. The project deals with the development of innovative software algorithms and mathematical tools, for the complete and reliable characterization of complex nanostructures (scaled to 10 ^ -9m) and nanostructured surfaces, in the fields of nanoelectronics and nanotechnology (microchips, transistors, smart surfaces etc.). He is also the COO of Nanometrisis P.C. and Nanoplasmas P.C. (also a spin out Company of NCSR Demokritos) and leading member of the Research and Development team of the metrology software of Nanometrisis P.C.


Dimitrakellis, P., Kaprou, G.D., Papavieros, G., Mastellos, D.C., Constantoudis, V., Tserepi, A. and Gogolides, E., Enhanced antibacterial activity of ZnO-PMMA nanocomposites by selective plasma etching in atmospheric pressure Micro and Nano Engineering, Volume 13, Article Number: 100098, 2021 [doi]

Papavieros, G., Constantoudis, V., Vouroutzis, N. and Gogolides, E., Measuring line edge roughness with pixel sizes larger than its value: A mathematical and computational approach Journal of Micro/Nanopatterning, Materials and Metrology, Volume 20, Article Number: 034001, 2021 [doi]

Constantoudis, Vassilios, Williams, Bradley, Kehagias, Nikolaos, Papavieros, George, Torres, Clivia M Sotomoyor and Gogolides, Evangelos, Characterization of defects in line/space patterns (Conference Presentation) Metrology, Inspection, and Process Control for Microlithography XXXIV, Volume 11325, Pages: 113250U, 2020 [doi]

Constantoudis, V., Papavieros, G. and Gogolides, E., Edge placement error and line edge roughness Volume 10959, Article Number: 109591F, 2019 [doi]

Miquelot, A., Debieu, O., Rouessac, V., Villeneuve, C., Prud'homme, N., Cure, J., Constantoudis, V., Papavieros, G., Roualdes, S. and Vahlas, C., TiO2 nanotree films for the production of green H2 by solar water splitting: From microstructural and optical characteristics to the photocatalytic properties Applied Surface Science, Volume 494, Pages: 1127-1137, 2019 [doi]

Papavieros, G., Kontoyiannis, I., Constantoudis, V. and Gogolides, E., Denoising line edge roughness measurement using hidden Markov models Volume 10959, Article Number: 109592Z, 2019 [doi]

Giannatou, E., Constantoudis, V., Papavieros, G., Papagrorgiou, H., Lorusso, G.F., Rutigliani, V., Van Roey, F. and Gogolides, E., Deep learning nanometrology of line edge roughness Volume 10959, Article Number: 1095920, 2019 [doi]

Constantoudis, Vassilios, Whitworth, Guy, Kehagias, Nikolaos, Papavieros, George, Torres, Clivia M Sotomoyor and Gogolides, Evangelos, Defects in nano-imprint lithography line patterns: computational modelling and measurement accuracy Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019, Volume 10958, Pages: 109581K, 2019 [doi]

Rutigliani, V., Lorusso, G.F., De Simone, D., Lazzarino, F., Rispens, G., Papavieros, G., Gogolides, E., Constantoudis, V. and Mack, C.A., Setting up a proper power spectral density (PSD) and autocorrelation analysis for material and process characterization Volume 10585, Article Number: 105851K, 2018 [doi]

Papavieros, G., Constantoudis, V. and Gogolides, E., Allowable SEM noise for unbiased LER measurement Volume 10585, Article Number: 105851W, 2018 [doi]

Constantoudis, V., Papavieros, G., Lorusso, G., Rutigliani, V., Van Roey, F. and Gogolides, E., Multifractal analysis of line-edge roughness Volume 10585, Article Number: 1058534, 2018 [doi]

Constantoudis, V., Papavieros, G., Gogolides, E., Pret, A.V., Pathangi, H. and Gronheid, R., Challenges in line edge roughness metrology in directed self-Assembly lithography: Placement errors and cross-line correlations Journal of Micro/ Nanolithography, MEMS, and MOEMS, Volume 16, Article Number: 024001, 2017 [doi]

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