Nanoimprint Lithography Equipment

CNI (NIL Technology Aps)


Thermal and UV light assisted micro/nano patterning on rigid or flexible substrates. The CNI tools is a desktop lithography tool which give the opportunity to replicate a 4-inch master stamp with sub 20nm resolution. 

NIL lithography is used in a wide field of application such as: optics, (nano) photonics, Nano electronics, biomimetics, biotechnology, photovoltaics, NEMS/MEMS, etc.

  • Technical Specifications
  • Thermal and UV Light assisted modes
  • Substrate size: up to 4 inch
  • Substrate thickness: up to 10mm
  • Max Temperature: 220 oC
  • Max Pressure: 11 bars
  • UV Light wavelength: 365 nm

Skip to content