Nanoimprint Lithography Equipment
CNI (NIL Technology Aps)
Thermal and UV light assisted micro/nano patterning on rigid or flexible substrates. The CNI tools is a desktop lithography tool which give the opportunity to replicate a 4-inch master stamp with sub 20nm resolution.
NIL lithography is used in a wide field of application such as: optics, (nano) photonics, Nano electronics, biomimetics, biotechnology, photovoltaics, NEMS/MEMS, etc.
- Technical Specifications
- Thermal and UV Light assisted modes
- Substrate size: up to 4 inch
- Substrate thickness: up to 10mm
- Max Temperature: 220 oC
- Max Pressure: 11 bars
- UV Light wavelength: 365 nm